- 专利标题: Holding apparatus and method for holding a substrate
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申请号: US16420993申请日: 2019-05-23
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公开(公告)号: US11148258B2公开(公告)日: 2021-10-19
- 发明人: Thomas Grund , Rainer Targus
- 申请人: SUSS MicroTec Lithography GmbH
- 申请人地址: DE Garching
- 专利权人: SUSS MicroTec Lithography GmbH
- 当前专利权人: SUSS MicroTec Lithography GmbH
- 当前专利权人地址: DE Garching
- 代理机构: Hayes Soloway PC
- 优先权: NL2021006 20180529
- 主分类号: B25B11/00
- IPC分类号: B25B11/00 ; H01L21/683
摘要:
A holding apparatus, in particular a chuck, for a substrate comprises a main body with a upper side, a carrier element arranged in a recess of the main body so as to be vertically movable such that it can be adjusted between a protruding loading position and a retracted clamping position, the carrier element comprising a support surface for placement of the substrate. The support surface has a smaller diameter than the main body. A lifting element lifts the carrier element to the loading position. The carrier element seals the recess such that a sealed cavity is provided between the main body and the carrier element, which cavity can have a negative pressure applied thereto which counteracts the effect of the lifting element.