- Patent Title: Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
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Application No.: US16108893Application Date: 2018-08-22
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Publication No.: US11156915B2Publication Date: 2021-10-26
- Inventor: Hideaki Tsubaki , Wataru Nihashi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2016-060952 20160324
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/09 ; G03F7/32
Abstract:
An actinic ray-sensitive or radiation-sensitive composition contains a cation including a metal atom and a ligand, in which the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition is 10 or less.
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