公开(公告)号：US11460769B2

公开(公告)日：2022-10-04

申请号：US16109868

申请日：2018-08-23

Applicant: FUJIFILM Corporation

Inventor： Wataru Nihashi ,  Hideaki Tsubaki

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: An actinic ray-sensitive or radiation-sensitive composition, and an actinic ray-sensitive or radiation-sensitive composition obtained by the method for producing an actinic ray-sensitive or radiation-sensitive composition each contain a cation having a metal atom, and a ligand, in which a value of σ represented by Equation (1) is 2.2 or less. A pattern forming method and the method for manufacturing an electronic device each use the actinic ray-sensitive or radiation-sensitive composition. σ = ∑ k = 1 N ⁢ { ( μ - X k ) 2 × y k } ( 1 )

公开(公告)号：US10962884B2

公开(公告)日：2021-03-30

申请号：US15937876

申请日：2018-03-28

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Toru Tsuchihashi ,  Wataru Nihashi ,  Kei Yamamoto

IPC: G03F7/32 ,  G03F7/40 ,  G03F7/075 ,  G03F7/095 ,  G03F7/039 ,  G03F7/004 ,  G03F7/11 ,  G03F7/038 ,  H01L21/304 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern.
The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having an SP value of 16.3 MPa1/2 or less and a second organic solvent having an SP value of 17.1 MPa1/2 or more.

公开(公告)号：US10890847B2

公开(公告)日：2021-01-12

申请号：US15358537

申请日：2016-11-22

Applicant: FUJIFILM Corporation

Inventor： Toru Tsuchihashi ,  Wataru Nihashi ,  Hideaki Tsubaki

IPC: G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  G03F7/16 ,  G03F7/40 ,  C08F220/20 ,  C08F220/34 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F220/30 ,  C08F220/38

Abstract: A pattern forming method includes, in this order, forming a film on a substrate, using an active-light-sensitive or radiation-sensitive resin composition containing a resin (A) which has a repeating unit having a phenolic hydroxyl group, and a repeating unit having a group that decomposes by the action of an acid to generate a carboxyl group, and a compound (B) that generates an acid upon irradiation with active light or radiation; exposing the film; and developing the exposed film using a developer including an organic solvent, in which the developer including an organic solvent contains an organic solvent having 8 or more carbon atoms and 2 or less heteroatoms in the amount of 50% by mass or more.

公开(公告)号：US20190187558A1

公开(公告)日：2019-06-20

申请号：US16285839

申请日：2019-02-26

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Hajime Furutani ,  Akihiro Kaneko ,  Hideaki Tsubaki ,  Shuji Hirano

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/18 ,  C08F220/30

CPC classification number: G03F7/038 ,  C08F220/18 ,  C08F220/30 ,  C08F2220/302 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/38

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin and a compound that generates acid due to irradiation with an actinic ray or radiation. The resin includes a repeating unit (a) represented by Formula (I-1) and a repeating unit (b) having a group in which a protective group including a monocyclic ring leaves due to an action of an acid to generate a polar group. (In the formula, R11 and R12 each independently represent a hydrogen atom or an alkyl group. R13 represents a hydrogen atom or an alkyl group, or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring. n represents an integer of 2 or more.)

公开(公告)号：US09470980B2

公开(公告)日：2016-10-18

申请号：US14228894

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Naoki Inoue ,  Hiroo Takizawa ,  Shuji Hirano ,  Hideaki Tsubaki

IPC: G03F7/20 ,  C08F212/14 ,  G03C1/73 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/32 ,  C08F12/24

CPC classification number: G03F7/2002 ,  C08F12/24 ,  C08F212/14 ,  G03C1/733 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2039 ,  G03F7/2041 ,  G03F7/325 ,  C08F212/32

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Abstract translation: 图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂 树脂（A）在含有有机溶剂的显影剂中的溶解度，（B）在电子束或极紫外线照射时能够产生酸的化合物，（C）具有一个 或更多选自本说明书中定义的特定基团的基团和（D）溶剂; 步骤（2），用电子束或极紫外线辐射曝光胶片; 以及在暴露之后用含有机溶剂的显影剂显影该膜以形成负图案的步骤（4）。

公开(公告)号：US09448477B2

公开(公告)日：2016-09-20

申请号：US14656997

申请日：2015-03-13

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi Kawabata ,  Hideaki Tsubaki ,  Hiroo Takizawa

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32 ,  G03F7/004 ,  C08F8/32

CPC classification number: G03F7/0388 ,  C08F8/32 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract translation: 提供了光化射线敏感或辐射敏感性树脂组合物，其包含：（A）具有由特定式表示的重复单元的树脂和能够通过酸的作用分解以产生极性基团的基团; 和由该具体式表示的离子化合物，以及包含光化射线敏感或辐射敏感性树脂组合物的抗蚀剂膜。

公开(公告)号：US08852847B2

公开(公告)日：2014-10-07

申请号：US14074156

申请日：2013-11-07

Applicant: Fujifilm Corporation

Inventor： Hideaki Tsubaki

IPC: G03F7/004 ,  G03F7/26 ,  G03B27/32 ,  G03B27/52

CPC classification number: G03F7/2041 ,  G03F7/0392 ,  G03F7/325

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.

公开(公告)号：US11156915B2

公开(公告)日：2021-10-26

申请号：US16108893

申请日：2018-08-22

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Wataru Nihashi

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/09 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive composition contains a cation including a metal atom and a ligand, in which the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition is 10 or less.

公开(公告)号：US10562991B2

公开(公告)日：2020-02-18

申请号：US15849690

申请日：2017-12-21

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Toru Tsuchihashi ,  Wataru Nihashi

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  C08F12/24 ,  C09D125/18 ,  C08F12/22 ,  C08F212/14 ,  H01L21/027

Abstract: Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.

公开(公告)号：US10394127B2

公开(公告)日：2019-08-27

申请号：US15718659

申请日：2017-09-28

Applicant: FUJIFILM Corporation

Inventor： Wataru Nihashi ,  Hideaki Tsubaki ,  Toru Tsuchihashi ,  Tomotaka Tsuchimura

IPC: G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/039

Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.