Invention Grant
- Patent Title: Radon sensor device using polyhedral-shaped ionization chamber
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Application No.: US16972577Application Date: 2020-01-17
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Publication No.: US11169281B2Publication Date: 2021-11-09
- Inventor: Jae Jun Ko , Young Gweon Kim
- Applicant: FTLAB CO., LTD.
- Applicant Address: KR Ansan-si
- Assignee: FTLAB CO., LTD.
- Current Assignee: FTLAB CO., LTD.
- Current Assignee Address: KR Ansan-si
- Agency: Lucas & Mercanti, LLP
- Priority: KR10-2019-0047674 20190424
- International Application: PCT/KR2020/000837 WO 20200117
- International Announcement: WO2020/218714 WO 20201029
- Main IPC: G01T1/185
- IPC: G01T1/185 ; G01T1/178 ; G01T7/00

Abstract:
A radon sensor device using a polyhedral-shaped ionization chamber is proposed. The radon sensor device includes: an ionization chamber having an open side and inner sides surrounded by a first conductor and generating an electrical field therein by applying bias power to the first conductor; a cover having a first side covered with a second conductor and closing the open side of the ionization chamber such that that first conductor disposed on the inner sides of the ionization chamber and the second conductor are electrically connected; a probe unit disposed in the ionization chamber and absorbing ion charges produced when alpha (α) decay occurs in the ionization chamber; and a measurement circuit detecting an alpha particle detection signal by amplifying and processing an electrical micro-signal input from the probe unit into a predetermined magnitude.
Public/Granted literature
- US20210247527A1 RADON SENSOR DEVICE USING POLYHEDRAL-SHAPED IONIZATION CHAMBER Public/Granted day:2021-08-12
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