Invention Grant
- Patent Title: Method of manufacturing touch structure and touch structure
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Application No.: US16098030Application Date: 2018-04-08
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Publication No.: US11184985B2Publication Date: 2021-11-23
- Inventor: Jing Wang , Zouming Xu , Xiaodong Xie , Lei Zhang , Xianlin Ding , Qitao Zheng , Tsung Chieh Kuo , Dong Li , Qicheng Chen , Ting Zeng , Ming Zhang , Seong Cho Lee , Lingyan Wu , Guiyu Zhang
- Applicant: BOE Technology Group Co., Ltd. , Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Beijing; CN Anhui
- Assignee: BOE Technology Group Co., Ltd.,Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing; CN Anhui
- Agency: Banner & Witcoff, Ltd.
- Priority: CN201710725537.8 20170822
- International Application: PCT/CN2018/082197 WO 20180408
- International Announcement: WO2019/037433 WO 20190228
- Main IPC: H01H11/00
- IPC: H01H11/00 ; H03K17/96 ; H05K3/46 ; G06F3/044

Abstract:
A touch structure and a method of manufacturing the touch structure are provided. The method includes: forming a first conductive layer on a base substrate; forming a second conductive layer on the first conductive layer; and patterning the first conductive layer and the second conductive layer to respectively form a first conductive layer pattern and a second conductive layer pattern; the first conductive layer pattern is formed after the second conductive layer pattern is formed, and the first conductive layer pattern and the second conductive layer pattern are different from each other.
Public/Granted literature
- US20210223915A1 Method of Manufacturing Touch Structure and Touch Structure Public/Granted day:2021-07-22
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