Invention Grant
- Patent Title: Antireflection film having silver-containing layer and fluorocarbon layer, method for producing antireflection film, optical element, and optical system
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Application No.: US16288768Application Date: 2019-02-28
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Publication No.: US11194078B2Publication Date: 2021-12-07
- Inventor: Seigo Nakamura , Kenichi Umeda , Yuichiro Itai , Shinichiro Sonoda
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2016-177505 20160912
- Main IPC: G02B1/111
- IPC: G02B1/111 ; G02B1/113 ; G02B1/18 ; B32B15/04 ; B32B7/02 ; B32B9/00 ; B32B27/00 ; G02B15/14

Abstract:
Provided is an antireflection film that is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, in this order, on a substrate, in which the interlayer is a multilayer film having two or more layers, in which a layer of high refractive index having a relatively high refractive index and a layer of low refractive index having a relatively low refractive index are alternately laminated, and the dielectric layer has a surface to be exposed to air and is a multilayer film having two or more layers including an oxide layer and a fluorocarbon layer which is a self-assembled film that is formed by a silane coupling reaction to the oxide layer in this order.
Public/Granted literature
- US20190196064A1 ANTIREFLECTION FILM, METHOD FOR PRODUCING ANTIREFLECTION FILM, OPTICAL ELEMENT, AND OPTICAL SYSTEM Public/Granted day:2019-06-27
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