Antireflection film, optical element, and optical system

    公开(公告)号:US11422290B2

    公开(公告)日:2022-08-23

    申请号:US16813703

    申请日:2020-03-09

    Abstract: An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.

    Laminated film and method for producing laminated film

    公开(公告)号:US11422288B2

    公开(公告)日:2022-08-23

    申请号:US16799782

    申请日:2020-02-24

    Abstract: In a laminated film, a resin substrate, an organic/inorganic multilayer, and a silver-containing metal layer having a thickness of 20 nm or less are laminated in this order, an anchor metal diffusion control layer having a Hamaker constant of 7.3×10−20 J or more is provided on the surface of the inorganic layer, an anchor region containing an oxide of an anchor metal having a surface energy which has a smaller difference with a surface energy of the silver-containing metal layer than a surface energy of the anchor metal diffusion control layer is provided between the anchor metal diffusion control layer and the silver-containing metal layer, and a cap region containing an oxide of the anchor metal is provided on a surface of the silver-containing metal layer that is opposite from a surface on a side closer to the anchor metal diffusion control layer.

    Method for producing transparent optical film and method for producing transparent multilayer film

    公开(公告)号:US10927446B2

    公开(公告)日:2021-02-23

    申请号:US16568905

    申请日:2019-09-12

    Abstract: This method for producing a transparent optical film includes a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer formed of a high standard electrode potential metal having a higher standard electrode potential than that of silver by vacuum deposition, and an alloying step of forming a silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower.

    Method of manufacturing organic semiconductor film

    公开(公告)号:US10468597B2

    公开(公告)日:2019-11-05

    申请号:US16041766

    申请日:2018-07-21

    Abstract: A method of manufacturing an organic semiconductor film, including a step of moving a coating blade surface positioned to face a substrate surface in a first direction parallel to the substrate surface, while in contact with an organic semiconductor solution supplied to a portion between the blade surface and the substrate surface to form the organic semiconductor film in the first direction. The coating blade is disposed to have first and second gaps having different separation gap sizes with the substrate surface in a region where the blade surface and the organic semiconductor solution are in contact. The first gap is positioned on an upstream side of the first direction and the second gap, which is smaller than the first gap, is provided on a downstream side. A second gap size is a minimum distance between the substrate surface and the blade surface and is 40 μm or less.

    SILENCING STRUCTURE AND SILENCING SYSTEM
    9.
    发明公开

    公开(公告)号:US20230408143A1

    公开(公告)日:2023-12-21

    申请号:US18363812

    申请日:2023-08-02

    CPC classification number: F24F13/24 F24F2013/242

    Abstract: To provide a silencing structure and a silencing system having a high sound absorbance in a low frequency region. A silencing structure that is installed in a tubular member, the silencing structure includes a cavity portion, an opening portion through which the cavity portion communicates with the tubular member, and a closing portion that closes the cavity portion at a position facing the opening portion, in which a cross-sectional area of the cavity portion on a side of the opening portion is larger than a cross-sectional area of the cavity portion on a side of the closing portion.

    Method of manufacturing film using alignment material

    公开(公告)号:US10608119B2

    公开(公告)日:2020-03-31

    申请号:US16114610

    申请日:2018-08-28

    Abstract: Provided is a method of manufacturing a film, including: a manufacturing step of forming a film by performing movement, in a state in which a blade surface of a coating blade disposed to be spaced so as to face a substrate surface of a substrate is in contact with a solution for forming a film which is provided between the blade surface and the substrate surface, in a first direction in a plane parallel to the substrate surface, in which the solution is stored in a liquid reservoir between the blade surface and the substrate surface, and at least a portion of an outer peripheral end portion of the coating blade which is in contact with the solution is tilted with respect to the first direction in a plane parallel to the substrate surface. Accordingly, a method of manufacturing a film for forming a high quality film with high productivity is provided.

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