Invention Grant
- Patent Title: Methods and apparatus for wafer handling and processing
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Application No.: US16386517Application Date: 2019-04-17
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Publication No.: US11195740B2Publication Date: 2021-12-07
- Inventor: Andrew M. Bayless , Kyle K. Kirby
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L23/48 ; H01L21/306

Abstract:
An assembly comprising a device wafer received in a recess of a carrier wafer. A device wafer comprising a protrusion terminating at an active surface bearing integrated circuitry, the protrusion surrounded by a peripheral flat extending to an outer periphery of the device wafer. A method of wafer thinning using the previously described carrier wafer and device wafer. Various implementations of a carrier wafer having a recess are also disclosed, as are methods of fabrication.
Public/Granted literature
- US20200335379A1 METHODS AND APPARATUS FOR WAFER HANDLING AND PROCESSING Public/Granted day:2020-10-22
Information query
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