Invention Grant
- Patent Title: Charged particle beam device and electrostatic lens
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Application No.: US16664100Application Date: 2019-10-25
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Publication No.: US11201033B2Publication Date: 2021-12-14
- Inventor: Yuta Kawamoto , Akira Ikegami , Masahiro Fukuta
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JPJP2018-229449 20181206
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/147 ; H01J37/12 ; H01J37/28

Abstract:
To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.
Public/Granted literature
- US20200185186A1 Charged Particle Beam Device and Electrostatic Lens Public/Granted day:2020-06-11
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