公开(公告)号：US11791124B2

公开(公告)日：2023-10-17

申请号：US17230650

申请日：2021-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira Ikegami ,  Yasushi Ebizuka ,  Nobuo Fujinaga

IPC: H01J37/10 ,  H01J37/153 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1472 ,  H01J2237/0473 ,  H01J2237/1534

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20190074159A1

公开(公告)日：2019-03-07

申请号：US16115287

申请日：2018-08-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Noritsugu Takahashi ,  Yasunari Sohda ,  Akira Ikegami ,  Yuta Kawamoto

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/141 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/244 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/2449 ,  H01J2237/248 ,  H01J2237/2817

Abstract: The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.

公开(公告)号：US11784023B2

公开(公告)日：2023-10-10

申请号：US17462455

申请日：2021-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira Ikegami ,  Yasushi Ebizuka ,  Nobuo Fujinaga

IPC: H01J37/10 ,  H01J37/153 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1472 ,  H01J2237/0473 ,  H01J2237/1534

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US11201033B2

公开(公告)日：2021-12-14

申请号：US16664100

申请日：2019-10-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira Ikegami ,  Masahiro Fukuta

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/12 ,  H01J37/28

Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.

公开(公告)号：US20210233738A1

公开(公告)日：2021-07-29

申请号：US17230650

申请日：2021-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US10559450B2

公开(公告)日：2020-02-11

申请号：US16115287

申请日：2018-08-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Noritsugu Takahashi ,  Yasunari Sohda ,  Akira Ikegami ,  Yuta Kawamoto

IPC: H01J37/141 ,  H01J37/04 ,  H01J37/28 ,  H01J37/244 ,  H01J37/147

Abstract: The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.

公开(公告)号：US10304654B2

公开(公告)日：2019-05-28

申请号：US15747847

申请日：2016-07-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira Ikegami ,  Yuta Kawamoto ,  Hideto Dohi ,  Manabu Yano ,  Yutaka Tandai ,  Hideyuki Kazumi

IPC: H01J37/04 ,  H01J37/21 ,  H01J37/147 ,  H01J37/248 ,  H01J37/28

Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.