Invention Grant
- Patent Title: Solid-state image sensor and method of manufacturing the same
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Application No.: US16454157Application Date: 2019-06-27
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Publication No.: US11205671B2Publication Date: 2021-12-21
- Inventor: Tomohiro Imoto , Satoshi Takahashi
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Taito-ku
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Taito-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2016-253556 20161227,JPJP2016-253650 20161227
- Main IPC: H01L27/146
- IPC: H01L27/146 ; G02B5/20 ; G02B3/00

Abstract:
A solid-state image sensor including a semiconductor substrate having photoelectric conversion elements being two-dimensionally formed therein, and a color filter layer formed on the semiconductor substrate and having color filters of colors being two-dimensionally formed therein in a pattern such that the color filters correspond respectively to the photoelectric conversion elements. The color filter layer satisfies formulas (1) and (2): 200≤A≤700 (1) C≤A+200 (2) where A represents a thickness in nm of a first-color color filter of a first color among the colors, and C represents a thickness in nm of color filters of colors other than the first color.
Public/Granted literature
- US20190319058A1 SOLID-STATE IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-10-17
Information query
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