- 专利标题: Quantum cascade laser and method for manufacturing same
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申请号: US16701217申请日: 2019-12-03
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公开(公告)号: US11205887B2公开(公告)日: 2021-12-21
- 发明人: Rei Hashimoto , Shinji Saito , Tomohiro Takase , Tsutomu Kakuno , Yuichiro Yamamoto , Kei Kaneko
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: JP Minato-ku
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JPJP2018-227481 20181204
- 主分类号: H01S5/343
- IPC分类号: H01S5/343 ; B82Y20/00 ; H01S5/02
摘要:
A quantum cascade laser of an embodiment includes a semiconductor stacked body in which a ridge waveguide is provided. The semiconductor stacked body includes an active layer including a quantum well region including a layer including Al; and the active layer emits laser light. The layer that includes Al includes first regions, and a second region interposed between the first regions; the first region includes Al oxide and reaches a prescribed depth inward from an outer edge of the active layer along a direction parallel to a surface of the active layer in a cross section orthogonal to the optical axis; and the second region does not include Al oxide.
公开/授权文献
- US20200176953A1 QUANTUM CASCADE LASER AND METHOD FOR MANUFACTURING SAME 公开/授权日:2020-06-04
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