Invention Grant
- Patent Title: Low water-sensitive dental composition
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Application No.: US16829259Application Date: 2020-03-25
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Publication No.: US11207247B2Publication Date: 2021-12-28
- Inventor: Yusei Kadobayashi , Hiroshi Yaana , Jun Uchida , Yuji Sadakane
- Applicant: SHOFU INC.
- Applicant Address: JP Kyoto
- Assignee: SHOFU INC.
- Current Assignee: SHOFU INC.
- Current Assignee Address: JP Kyoto
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2019-057535 20190326,JPJP2019-057536 20190326,JPJP2019-057537 20190326,JPJP2019-057538 20190326,JPJP2019-057555 20190326,JPJP2019-057556 20190326,JPJP2019-150038 20190819,JPJP2019-175309 20190926,JPJP2019-175327 20190926,JPJP2019-175336 20190926,JPJP2019-175354 20190926,JPJP2019-232733 20191224
- Main IPC: A61K6/889
- IPC: A61K6/889 ; A61K6/20 ; A61K6/833 ; C08F120/56 ; A61K6/836 ; A61K6/62 ; A61K6/77 ; A61K6/30 ; A61K6/40 ; A61K6/887

Abstract:
An object of the present disclosure is to provide a dental composition that can exhibit sufficient curability even in a state where moisture is excessive as in the oral environment. The dental composition of the present disclosure contains component (a): monomer containing (meth)acrylamide group represented by formula (1): (In formula, R represents a hydrogen atom or a methyl group and Rs may be the same or different from each other. R2 is an alkyl group having 2 to 6 carbon atoms and R2s may be the same or different from each other.)
Public/Granted literature
- US20210007938A1 LOW WATER-SENSITIVE DENTAL COMPOSITION Public/Granted day:2021-01-14
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