Invention Grant
- Patent Title: Laminated element manufacturing method
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Application No.: US16633808Application Date: 2018-07-13
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Publication No.: US11211250B2Publication Date: 2021-12-28
- Inventor: Takeshi Sakamoto , Ryuji Sugiura , Yuta Kondoh , Naoki Uchiyama
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JPJP2017-146861 20170728
- International Application: PCT/JP2018/026532 WO 20180713
- International Announcement: WO2019/021865 WO 20190131
- Main IPC: H01L21/268
- IPC: H01L21/268 ; H01L21/683 ; H01L25/065

Abstract:
A laminated element manufacturing method includes a first forming step of forming a first modified region along a line to cut by irradiating a semiconductor substrate of a first wafer with a laser light along the line to cut, a first grinding step of grinding the semiconductor substrate of the first wafer, a bonding step of bonding a circuit layer of a second wafer to the semiconductor substrate of the first wafer, a second forming step of forming a second modified region along the line to cut by irradiating a semiconductor substrate of the second wafer with a laser light along the line to cut, and a second grinding step of grinding the semiconductor substrate of the second wafer.
Public/Granted literature
- US20210057222A1 LAMINATED ELEMENT MANUFACTURING METHOD Public/Granted day:2021-02-25
Information query
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