Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16282548Application Date: 2019-02-22
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Publication No.: US11211447B2Publication Date: 2021-12-28
- Inventor: Hyukwoo Kwon , Ha-Young Yi , Byoungdeog Choi , Seongmin Choo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0085553 20180723
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L49/02 ; H01L21/311

Abstract:
A semiconductor device includes a substrate, a bottom electrode on the substrate, a first support layer on the substrate next to a sidewall of the bottom electrode, a dielectric layer covering the sidewall and a top surface of the bottom electrode, and a top electrode on the dielectric layer. The bottom electrode includes a first part having a plurality of protrusions that protrude from a sidewall of the first part. The first part of the bottom electrode may be on the first support layer.
Public/Granted literature
- US20200027947A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-01-23
Information query
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