Invention Grant
- Patent Title: Radiation device
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Application No.: US16904646Application Date: 2020-06-18
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Publication No.: US11217884B2Publication Date: 2022-01-04
- Inventor: Hang-Lang Lee , I-Yin Li , Tang-Chin Hung , Pei-Chi Chen
- Applicant: InnoLux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: InnoLux Corporation
- Current Assignee: InnoLux Corporation
- Current Assignee Address: TW Miao-Li County
- Agency: McClure, Qualey & Rodack, LLP
- Priority: CN202010362576.8 20200430
- Main IPC: H01Q1/38
- IPC: H01Q1/38 ; H03C7/02

Abstract:
A radiation device includes: a first substrate; a second substrate; a dielectric layer disposed between the first substrate and the second substrate; and a film layer structure disposed on the first substrate. The resistivity of the film layer structure is between 108 and 5×1014 Ω-cm. Therefore, frequency modulation range of radiation signals of the radiation device can be increased.
Public/Granted literature
- US20210021023A1 RADIATION DEVICE Public/Granted day:2021-01-21
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