Invention Grant
- Patent Title: Methods and apparatus for use in a device manufacturing method
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Application No.: US16638552Application Date: 2018-08-08
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Publication No.: US11226567B2Publication Date: 2022-01-18
- Inventor: Richard Johannes Franciscus Van Haren , Leon Paul Van Dijk , Ilya Malakhovsky , Ronald Henricus Johannes Otten , Mahdi Sadeghinia
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17191649 20170918
- International Application: PCT/EP2018/071492 WO 20180808
- International Announcement: WO2019/052746 WO 20190321
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00

Abstract:
Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.
Public/Granted literature
- US20200218169A1 METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD Public/Granted day:2020-07-09
Information query
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