Invention Grant
- Patent Title: Nail production system and nail production method
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Application No.: US16301842Application Date: 2017-06-05
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Publication No.: US11229272B2Publication Date: 2022-01-25
- Inventor: Fumiko Shiga , Tomomasa Watanabe , Naoko Ishiduka , Soichi Fukasawa , Yue Ouyang , Sachiko Takahashi , Nobuyuki Uchiyama , Akira Tange
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JPJP2016-142186 20160720
- International Application: PCT/JP2017/020761 WO 20170605
- International Announcement: WO2018/016205 WO 20180125
- Main IPC: H04N1/00
- IPC: H04N1/00 ; A45D31/00 ; G06Q30/06 ; B41M1/40 ; H04N1/23

Abstract:
A nail production system according to an embodiment of the disclosure includes a first correction section and a first conversion section. The first correction section corrects shape data of an existing nail tip or an existing nail sticker on the basis of measurement data of a nail, to thereby generate shape data of an original nail tip or an original nail sticker. The first conversion section converts the shape data of the original nail tip or the original nail sticker that is generated by the first correction section into print data.
Public/Granted literature
- US20190150586A1 NAIL PRODUCTION SYSTEM AND NAIL PRODUCTION METHOD Public/Granted day:2019-05-23
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