Invention Grant
- Patent Title: Array substrate and preparation method thereof
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Application No.: US16836308Application Date: 2020-03-31
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Publication No.: US11239113B2Publication Date: 2022-02-01
- Inventor: Wei Chen , Zhiqiang Zhang , Hanqing Liu , Yangheng Li , Mingming Jia , Xin Li , Yong Song
- Applicant: Beijing BOE Optoelectronics Technology Co., Ltd. , BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing; CN Beijing
- Assignee: Beijing BOE Optoelectronics Technology Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee: Beijing BOE Optoelectronics Technology Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing; CN Beijing
- Agency: Arent Fox LLP
- Agent Michael Fainberg
- Priority: CN201911101525.3 20191112
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L21/768

Abstract:
The present disclosure discloses an array substrate and a preparation method thereof. After a first passivation layer is formed, residual gas is directly drawn out of a closed chamber to prevent the residual gas from reacting to form an unstable layer on the first passivation layer. Furthermore, after the residual gas is drawn out, a preset gas fills the closed chamber, and is retained for a preset time period and then drawn out. The retaining of the preset gas can effectively alleviate the damage to the passivation layer by static electricity.
Public/Granted literature
- US20210143057A1 ARRAY SUBSTRATE AND PREPARATION METHOD THEREOF Public/Granted day:2021-05-13
Information query
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