Invention Grant
- Patent Title: Pre-clean chamber and process with substrate tray for changing substrate temperature
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Application No.: US16447297Application Date: 2019-06-20
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Publication No.: US11264255B2Publication Date: 2022-03-01
- Inventor: John Tolle , Eric R. Hill
- Applicant: ASM IP HOLDING B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP HOLDING B.V.
- Current Assignee: ASM IP HOLDING B.V.
- Current Assignee Address: NL Almere
- Agency: Knobbe, Martens, Olson & Bear LLP
- Main IPC: B05C9/14
- IPC: B05C9/14 ; H01L21/67

Abstract:
A system for removing an oxide material from a surface of a substrate can include a substrate tray to receive the substrate, and a cooling body to receive the substrate tray. The system may include a first temperature control element configured to control a temperature of the substrate tray and a second temperature control element configured to control a temperature of the cooling body, where the first temperature control element and the second temperature control element can be independently controlled. A method for removing oxide material from a surface of a substrate can include providing the substrate on a substrate tray having heating elements, cooling the substrate by transferring heat from the substrate tray to a cooling body, depositing a halogen-containing material on the cooled substrate while the substrate is on the cooling body, and subsequently sublimating the halogen-containing material by heating the cooled substrate by transferring heat from the substrate tray to the substrate.
Public/Granted literature
- US20190333793A1 PRE-CLEAN CHAMBER AND PROCESS WITH SUBSTRATE TRAY FOR CHANGING SUBSTRATE TEMPERATURE Public/Granted day:2019-10-31
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