Invention Grant
- Patent Title: Method for forming pattern using antireflective coating composition including photoacid generator
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Application No.: US16517950Application Date: 2019-07-22
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Publication No.: US11269252B2Publication Date: 2022-03-08
- Inventor: Jung-June Lee , Jae-Yun Ahn , Jae-Hwan Sim , Jae-Bong Lim , Emad Aqad , Myung-Yeol Kim
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. , ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Applicant Address: KR Cheonan-si; US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.,ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.,ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: KR Cheonan-si; US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/09 ; G03F7/00 ; C08G12/42
Abstract:
An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
Public/Granted literature
- US20210026242A1 METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION INCLUDING PHOTOACID GENERATOR Public/Granted day:2021-01-28
Information query
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