- 专利标题: Power semiconductor device and manufacturing method thereof, and power conversion device
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申请号: US16442755申请日: 2019-06-17
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公开(公告)号: US11271352B2公开(公告)日: 2022-03-08
- 发明人: Yoshiaki Takewaki , Yoshihisa Uchida , Yo Tanaka
- 申请人: Mitsubishi Electric Corporation
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Studebaker & Brackett PC
- 优先权: JPJP2018-148968 20180808
- 主分类号: H01R43/02
- IPC分类号: H01R43/02 ; H01L23/498 ; H01R12/51 ; H01R4/02 ; H02M7/5387 ; H05K1/18 ; H05K1/09 ; H05K3/32 ; H02M1/08 ; H01L29/739
摘要:
The object is to provide a technology capable of increasing the reliability of a power semiconductor device. A power semiconductor device includes: a substrate including an insulating layer and a circuit pattern that are disposed in this order; a power semiconductor element electrically connected to the circuit pattern; and an electrode terminal having a thinned portion including a welded portion welded to the circuit pattern by a fiber laser. A thickness of the circuit pattern is not less than 0.2 and not more than 0.5 mm, and a thickness of the thinned portion of the electrode terminal is not less than one time and not more than two times the thickness of the circuit pattern.
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