Invention Grant
- Patent Title: Method of fabricating semiconductor light-emitting device and semiconductor light-emitting device
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Application No.: US16777707Application Date: 2020-01-30
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Publication No.: US11283233B2Publication Date: 2022-03-22
- Inventor: Hitoshi Sato , Kazuya Yamada , Hiroki Nagai
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JPJP2017-151626 20170804
- Main IPC: H01S5/02
- IPC: H01S5/02 ; H01S5/028 ; H01S5/22 ; H01S5/343 ; H01L33/00 ; H01L33/16 ; H01L33/44 ; B28D5/00 ; H01S5/042 ; H01S5/32 ; H01L21/3065 ; H01L33/30

Abstract:
A method of fabricating a semiconductor light-emitting device includes: (a) forming a semiconductor layer including a light-emitting layer on the first surface of a substrate; (b) forming a first trench and a second trench in the semiconductor layer, the first trench extending in a first direction that is parallel to a principal plane of the substrate, and the second trench being disposed inside and parallel to the first trench; (c) forming a third trench parallel to the first trench in the second surface of the substrate opposite to the first surface of the substrate; and (d) forming a semiconductor light-emitting device by dividing the substrate. In (d), an end of at least one divided side of the semiconductor light-emitting device is in the second trench. The first trench has a first width, and the second trench has a second width. The second width is less than the first width.
Public/Granted literature
- US20200169058A1 METHOD OF FABRICATING SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING DEVICE Public/Granted day:2020-05-28
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