Invention Grant
- Patent Title: Integrated X-ray source
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Application No.: US16742733Application Date: 2020-01-14
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Publication No.: US11289300B2Publication Date: 2022-03-29
- Inventor: Peiyan Cao , Yurun Liu
- Applicant: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN XPECTVISION TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: IPRO, PLLC
- Main IPC: H01J35/06
- IPC: H01J35/06 ; H01J35/08 ; A61B6/00 ; H01J35/04 ; A61B6/03

Abstract:
Disclosed herein is an X-ray source, comprising: a cathode in a recess of a first substrate; a counter electrode on a sidewall of the recess, configured to cause field emission of electrons from the cathode; and a metal anode configured to receive the electrons emitted from the cathode and to emit X-ray from impact by the electrons on the metal anode.
Public/Granted literature
- US20200161075A1 INTEGRATED X-RAY SOURCE Public/Granted day:2020-05-21
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