Invention Grant
- Patent Title: Lithographic apparatus
-
Application No.: US16982650Application Date: 2019-03-11
-
Publication No.: US11294291B2Publication Date: 2022-04-05
- Inventor: Marcus Adrianus Van De Kerkhof , Johannes Hubertus Josephina Moors
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Priority: EP18166991 20180412,NL2021345 20180719
- International Application: PCT/EP2019/055937 WO 20190311
- International Announcement: WO2019/197091 WO 20191017
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 μm, desirably less than 1 μm.
Public/Granted literature
- US20210026258A1 LITHOGRAPHIC APPARATUS Public/Granted day:2021-01-28
Information query
IPC分类:
