Invention Grant
- Patent Title: Transmission gate structure and method
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Application No.: US17116745Application Date: 2020-12-09
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Publication No.: US11295055B2Publication Date: 2022-04-05
- Inventor: Shao-Lun Chien , Pin-Dai Sue , Li-Chun Tien , Ting-Wei Chiang , Ting Yu Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F30/398
- IPC: G06F30/398 ; G03F1/36 ; G06F30/392 ; G06F30/394

Abstract:
A transmission gate structure includes two PMOS transistors in a first active area, two NMOS transistors in a second active area, a first metal zero segment overlying the first active area, a second metal zero segment offset from the first metal zero segment by a distance, a third metal zero segment offset from the second metal zero segment by the distance, a fourth metal zero segment offset from the third metal zero segment by the distance and overlying the second active area. A first conductive segment overlies a first portion of the first active area included in one or both PMOS transistors, and a second conductive segment overlies a second portion of the second active area included in one or both NMOS transistors. The active areas and metal zero segments are perpendicular to the conductive segments, and the PMOS and NMOS transistors are coupled together through the conductive segments.
Public/Granted literature
- US20210089702A1 TRANSMISSION GATE STRUCTURE AND METHOD Public/Granted day:2021-03-25
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