Invention Grant
- Patent Title: Normalized object exposure for collaborative platforms
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Application No.: US15155416Application Date: 2016-05-16
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Publication No.: US11295273B2Publication Date: 2022-04-05
- Inventor: Dave Schikora , Ole Lilienthal , Michael Burwig , Pit Humke , Leif Jensen-Pistorius , Peer Hilgers , Martin Wezowski , Thomas Spangemacher
- Applicant: SAP SE
- Applicant Address: DE Walldorf
- Assignee: SAP SE
- Current Assignee: SAP SE
- Current Assignee Address: DE Walldorf
- Agency: Fish & Richardson P.C.
- Main IPC: G06F3/00
- IPC: G06F3/00 ; G06F9/00 ; G06F17/00 ; G06Q10/10 ; G06F16/25

Abstract:
Techniques are described for providing normalized object exposure in a collaborative platform. Implementations provide a collaborative platform to enable multiple users to collaborate to address an issue collectively. The platform enables a user to create a work routine in which objects may be added and manipulated by multiple users. The objects may be normalized through use of a normalized object contract. Tools may be added to the work routine, and linked to objects to apply functionality to the object data of the objects. The tools may also comply with the normalized object contract to be consumable within the platform. Through the contract, objects may exhibit a shared common state such that multiple users and/or processes access the same state for a particular object at any given time in a work routine.
Public/Granted literature
- US20170330151A1 NORMALIZED OBJECT EXPOSURE FOR COLLABORATIVE PLATFORMS Public/Granted day:2017-11-16
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