Invention Grant
- Patent Title: Method of applying particles
-
Application No.: US16307832Application Date: 2017-06-07
-
Publication No.: US11300837B2Publication Date: 2022-04-12
- Inventor: Su Young Ryu , Jung Woon Kim , Tae Gyun Kwon , Moon Soo Park
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: KRKR10-2016-0070564 20160607,KRKR10-2017-0070561 20170607
- International Application: PCT/KR2017/005890 WO 20170607
- International Announcement: WO2017/213405 WO 20171214
- Main IPC: G02F1/1339
- IPC: G02F1/1339 ; C09D201/00 ; G02F1/1337 ; C08J7/06 ; C08J7/04 ; C08J5/18 ; B82Y20/00 ; B82Y30/00

Abstract:
The present application relates to a method of applying particles, an optical film and a method of manufacturing an active liquid crystal device. In the method of applying particles of the present application, the particles can be uniformly applied on a base material and fixed while maintaining the shape of particles. The optical film of the present invention produced by the above method can have excellent particle dispersity. A method of manufacturing an active liquid crystal device using the above method can maintain a cell gap uniformly while simplifying the manufacturing process and preventing gravity defects.
Public/Granted literature
- US20190212599A1 Method of Applying Particles Public/Granted day:2019-07-11
Information query
IPC分类: