Invention Grant
- Patent Title: Apparatus for multiple charged-particle beams
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Application No.: US16536284Application Date: 2019-08-08
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Publication No.: US11302514B2Publication Date: 2022-04-12
- Inventor: Weiming Ren , Xuedong Liu , Xuerang Hu , Zong-wei Chen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/06 ; H01J37/10 ; H01J37/147

Abstract:
Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.
Public/Granted literature
- US20200051779A1 APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS Public/Granted day:2020-02-13
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