Invention Grant
- Patent Title: Opto-electronic device having junction field-effect transistor structure and image sensor including the opto-electronic device
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Application No.: US16930574Application Date: 2020-07-16
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Publication No.: US11302740B2Publication Date: 2022-04-12
- Inventor: Kyungsang Cho , Chanwook Baik , Hojung Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2020-0014353 20200206
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H01L31/0384 ; H01L31/112 ; H01L27/146

Abstract:
Provided is an opto-electronic device having low dark noise and a high signal-to-noise ratio. The opto-electronic device may include: a first semiconductor layer doped to have a first conductivity type; a second semiconductor layer disposed on an upper surface of the first semiconductor layer and doped to have a second conductivity type electrically opposite to the first conductivity type; a transparent matrix layer disposed on an upper surface of the second semiconductor layer; a plurality of quantum dots arranged to be in contact with the transparent matrix layer; and a first electrode provided on a first side of the transparent matrix layer and a second electrode provided on a second side of the transparent matrix layer opposite to the first side, wherein the first electrode and the second electrode are electrically connected to the second semiconductor layer.
Public/Granted literature
Information query
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