Invention Grant
- Patent Title: Circuit board structure and manufacturing method thereof
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Application No.: US17234826Application Date: 2021-04-20
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Publication No.: US11315865B2Publication Date: 2022-04-26
- Inventor: Chien-Chen Lin
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: CKC & Partners Co., LLC
- Priority: TW108125490 20190718
- Main IPC: H05K3/06
- IPC: H05K3/06 ; H01L23/498 ; H01L21/48 ; H05K1/11

Abstract:
A method of manufacturing circuit board structure includes forming a sacrificial layer having first openings on a substrate; forming a metal layer on the sacrificial layer; forming a patterned photoresist layer having second openings over the sacrificial layer, in which the second openings are connected to the first openings and expose a portion of the metal layer; forming a first circuit layer filling the second openings and the first openings; forming a first dielectric layer over the sacrificial layer and covering the metal layer, in which the first dielectric layer has third openings exposing the first circuit layer; forming a second circuit layer filling the third openings and covering a portion of the first dielectric layer; removing the substrate to expose the sacrificial layer, a portion of the metal layer and a portion of the first circuit layer; and removing the sacrificial layer and the metal layer.
Public/Granted literature
- US20210242123A1 CIRCUIT BOARD STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-08-05
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