- 专利标题： Active matrix substrate, display device, and method of manufacturing active matrix substrate
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申请号： US16627097申请日： 2018-06-28
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公开(公告)号： US11322523B2公开(公告)日： 2022-05-03
- 发明人: Keiichi Ina , Yasuyoshi Kaise
- 申请人： SHARP KABUSHIKI KAISHA
- 申请人地址： JP Sakai
- 专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人地址： JP Sakai
- 代理机构： ScienBiziP, P.C.
- 优先权： JPJP2017-132280 20170705
- 国际申请： PCT/JP2018/024628 WO 20180628
- 国际公布： WO2019/009184 WO 20190110
- 主分类号： G02F1/13
- IPC分类号： G02F1/13 ; H01L27/12 ; G02F1/1362 ; G02F1/1368 ; G04G17/02 ; H01L29/40 ; G04B19/04
摘要：
To reduce a reduction in the quality of a displayed image in portions corresponding to source lines including detour portions in a display area. Gate lines (20) and source lines (30), which intersect with each other, extend on an insulating substrate (1) so as to detour an opening area (A1). Separated portions (24) are provided as lower shielding electrodes (23) in an inner non-display area (A2) so as to be overlapped with source detour portions (31) of the source lines (30) in a plan view.
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