- 专利标题: Strain gauge with improved design to reduce pinholes and damage
-
申请号: US16650566申请日: 2018-09-27
-
公开(公告)号: US11326966B2公开(公告)日: 2022-05-10
- 发明人: Toshiaki Asakawa , Akiyo Yuguchi , Yuta Aizawa , Syota Taneda
- 申请人: MINEBEA MITSUMI Inc.
- 申请人地址: JP Nagano
- 专利权人: MINEBEA MITSUMI Inc.
- 当前专利权人: MINEBEA MITSUMI Inc.
- 当前专利权人地址: JP Nagano
- 代理机构: IPUSA, PLLC
- 优先权: JPJP2017-191822 20170929
- 国际申请: PCT/JP2018/035938 WO 20180927
- 国际公布: WO2019/065840 WO 20190404
- 主分类号: G01L1/22
- IPC分类号: G01L1/22 ; G01B7/16
摘要:
A strain gauge includes a flexible substrate, and a functional layer formed of a metal, an alloy, or a metal compound, directly on one surface of the substrate. The strain gauge includes a resistor formed of a film including Cr, CrN, and Cr2N, on one surface of the functional layer. The substrate includes a filler. Surface unevenness on one surface of the substrate is 15 nm or less, and the resistor has a film thickness of 0.05 μm or more.
公开/授权文献
- US20200333199A1 STRAIN GAUGE 公开/授权日:2020-10-22
信息查询