Invention Grant
- Patent Title: Semiconductor device having a conductive film on an inner wall of a through hole
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Application No.: US16654350Application Date: 2019-10-16
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Publication No.: US11329012B2Publication Date: 2022-05-10
- Inventor: Takuya Kitabayashi , Hiroshi Yoshida , Hidetoshi Ishibashi , Daisuke Murata
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JPJP2019-005675 20190117
- Main IPC: H01L23/62
- IPC: H01L23/62 ; H01L23/498 ; H01L23/492

Abstract:
A technique for activating a fuse function in a semiconductor device in a relatively short time is provided. The semiconductor device includes a second bonding material provided on the upper surface of the insulating substrate, a third bonding material provided on an upper surface of the semiconductor element, a through hole extending from the first circuit pattern to the second circuit pattern via the core material, a conductive film provided on an inner wall of the through hole, and a heat insulating material provided inside the through hole and surrounded by the conductive film in plan view. The conductive film allows the first circuit pattern and the second circuit pattern to be conductive.
Public/Granted literature
- US20200235060A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-07-23
Information query
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