Invention Grant
- Patent Title: Method for expanding sheath and bulk of plasma by using double radio frequency
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Application No.: US16770043Application Date: 2018-08-28
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Publication No.: US11330698B2Publication Date: 2022-05-10
- Inventor: Ji Mo Lee , Gun Su Yun , Jae Koo Lee , Seung Taek Lee , Woo Jin Nam , Won Seok Kim
- Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATION
- Applicant Address: KR Pohang-si
- Assignee: POSTECH ACADEMY-INDUSTRY FOUNDATION
- Current Assignee: POSTECH ACADEMY-INDUSTRY FOUNDATION
- Current Assignee Address: KR Pohang-si
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2017-0165416 20171204
- International Application: PCT/KR2018/009898 WO 20180828
- International Announcement: WO2019/112148 WO 20190613
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46

Abstract:
The objective of the present disclosure is to provide a method of expanding the sheath and bulk of plasma using dual high frequencies, in which the sheath and bulk of microwave-generated plasma are expanded. The method of expanding the sheath and bulk of plasma using dual high frequencies according to one embodiment of the present disclosure includes: a generation step of generating plasma by a microwave plasma generator; and an expansion step of expanding the sheath and bulk of the plasma by applying a radio-frequency (RF) bias to a radio-frequency electrode disposed at a predetermined distance from the microwave plasma generator.
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