公开(公告)号：US11330698B2

公开(公告)日：2022-05-10

申请号：US16770043

申请日：2018-08-28

Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATION

Inventor： Ji Mo Lee ,  Gun Su Yun ,  Jae Koo Lee ,  Seung Taek Lee ,  Woo Jin Nam ,  Won Seok Kim

IPC: H01J37/32 ,  H05H1/46

Abstract: The objective of the present disclosure is to provide a method of expanding the sheath and bulk of plasma using dual high frequencies, in which the sheath and bulk of microwave-generated plasma are expanded. The method of expanding the sheath and bulk of plasma using dual high frequencies according to one embodiment of the present disclosure includes: a generation step of generating plasma by a microwave plasma generator; and an expansion step of expanding the sheath and bulk of the plasma by applying a radio-frequency (RF) bias to a radio-frequency electrode disposed at a predetermined distance from the microwave plasma generator.