Invention Grant
- Patent Title: Systems and methods for improved vapor deposition on complex geometry components
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Application No.: US16664129Application Date: 2019-10-25
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Publication No.: US11332822B2Publication Date: 2022-05-17
- Inventor: Su Jung Han , Julie A. Swartz , Grant W. Brady
- Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Applicant Address: US MI Detroit
- Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Current Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Current Assignee Address: US MI Detroit
- Agency: Quinn IP Law
- Main IPC: C23C14/54
- IPC: C23C14/54

Abstract:
An exemplary method of depositing a layer of a material on an interior substrate surface of a complex geometry component includes the steps of providing the complex geometry component having an aperture defining an edge of the interior substrate surface of the complex geometry component, at least a portion of the interior substrate surface defining a first area not visible from the aperture, providing a heating element adjacent to the first area of the complex geometry component, energizing the heating element to raise a surface temperature of the first area and establish a thermal gradient between the first area and an adjacent area, and providing a vapor deposition apparatus configured to deposit the layer of material on the interior substrate surface corresponding to the first area of the complex geometry component.
Public/Granted literature
- US20210123132A1 SYSTEMS AND METHODS FOR IMPROVED VAPOR DEPOSITION ON COMPLEX GEOMETRY COMPONENTS Public/Granted day:2021-04-29
Information query
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