Invention Grant
- Patent Title: Chamber body design architecture for next generation advanced plasma technology
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Application No.: US14693254Application Date: 2015-04-22
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Publication No.: US11333246B2Publication Date: 2022-05-17
- Inventor: Andrew Nguyen , Bradley J. Howard , Nicolas J. Bright
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Agent B. Todd Patterson
- Main IPC: F16J10/02
- IPC: F16J10/02 ; H01J37/32
Abstract:
An apparatus for processing a substrate is disclosed and includes, in one embodiment, a twin chamber housing having two openings formed therethrough, a first pump interface member coaxially aligned with one of the two openings formed in the twin chamber housing, and a second pump interface member coaxially aligned with another of the two openings formed in the twin chamber housing, wherein each of the pump interface members include three channels that are concentric with a centerline of the two openings.
Public/Granted literature
- US20160215883A1 CHAMBER BODY DESIGN ARCHITECTURE FOR NEXT GENERATION ADVANCED PLASMA TECHNOLOGY Public/Granted day:2016-07-28
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