Some embodiments include a transistor having an active region containing semiconductor material. The semiconductor material includes at least one element selected from Group 13 of the periodic table in combination with at least one element selected from Group 16 of the periodic table. The active region has a first region, a third region offset from the first region, and a second region between the first and third regions. A gating structure is operatively adjacent to the second region. A first carrier-concentration-gradient is within the first region, and a second carrier-concentration-gradient is within the third region. Some embodiments include methods of forming integrated assemblies.