Invention Grant
- Patent Title: Systems and methods for ICPMS matrix offset calibration
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Application No.: US17229107Application Date: 2021-04-13
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Publication No.: US11348773B2Publication Date: 2022-05-31
- Inventor: Daniel R. Wiederin , Kyle W. Uhlmeyer , Michael P. Field , Jae Seok Lee
- Applicant: Elemental Scientific, Inc.
- Applicant Address: US NE Omaha
- Assignee: Elemental Scientific, Inc.
- Current Assignee: Elemental Scientific, Inc.
- Current Assignee Address: US NE Omaha
- Agency: Advent, LLP
- Agent Kevin E. West
- Main IPC: G01J3/443
- IPC: G01J3/443 ; H01J49/00 ; H01J49/10 ; G01N21/27 ; G01N33/18 ; H01J49/26 ; G01J3/28 ; G01N21/35 ; G01N21/73

Abstract:
Systems and methods are described for calibrating an analytical instrument analyzing a plurality of sample matrices in series. A system embodiment can include, but is not limited to, a sample analysis device configured to receive a plurality of samples from a plurality of remote sampling systems and to determine an intensity of one or more species of interest contained in each of the plurality of samples; and a controller configured to generate a primary calibration curve based on analysis of a first standard solution having a first sample matrix by the sample analysis device and generate at least one secondary calibration curve based on analysis of a second standard solution having a second sample matrix by the sample analysis device, the controller configured to associate the at least one secondary calibration curve with the primary calibration curve according to a matrix correction factor.
Public/Granted literature
- US20210327696A1 SYSTEMS AND METHODS FOR ICPMS MATRIX OFFSET CALIBRATION Public/Granted day:2021-10-21
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