• Patent Title: Method for manufacturing a hybrid structure
  • Application No.: US15769690
    Application Date: 2016-10-17
  • Publication No.: US11349065B2
    Publication Date: 2022-05-31
  • Inventor: Didier Landru
  • Applicant: Soitec
  • Applicant Address: FR Bernin
  • Assignee: Soitec
  • Current Assignee: Soitec
  • Current Assignee Address: FR Bernin
  • Agency: TraskBritt
  • Priority: FR1559993 20151020
  • International Application: PCT/FR2016/052674 WO 20161017
  • International Announcement: WO2017/068269 WO 20170427
  • Main IPC: H01L41/313
  • IPC: H01L41/313 H03H9/02 H01L41/083 H01L41/053 H01L41/08
Method for manufacturing a hybrid structure
Abstract:
A method for manufacturing a hybrid structure comprising an effective layer of piezoelectric material having an effective thickness and disposed on a supporting substrate having a substrate thickness and a thermal expansion coefficient lower than that of the effective layer includes: a) a step of providing a bonded structure comprising a piezoelectric material donor substrate and the supporting substrate, b) a first step of thinning the donor substrate to form a thinned layer having an intermediate thickness and disposed on the supporting substrate, the assembly forming a thinned structure; c) a step of heat treating the thinned structure at an annealing temperature; and d) a second step, after step c), of thinning the thinned layer to form the effective layer. The method also comprises, prior to step b), a step a′) of determining a range of intermediate thicknesses that prevent the thinned structure from being damaged during step c).
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