Invention Grant
- Patent Title: Semiconductor device, method of fabricating the same, and display device including the same
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Application No.: US16842933Application Date: 2020-04-08
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Publication No.: US11362247B2Publication Date: 2022-06-14
- Inventor: Kiho Kong , Junhee Choi , Jinjoo Park , Joohun Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2019-0118376 20190925
- Main IPC: H01L33/64
- IPC: H01L33/64 ; H01L33/62 ; H01L33/38 ; H01L27/15

Abstract:
A semiconductor device includes a substrate including a first region and a second region that are arranged in a first direction that is parallel to an upper surface of the substrate; a separation layer provided on the first region of the substrate; a high electron mobility transistor (HEMT) device overlapping the separation layer in a second direction that is perpendicular to the upper surface of the substrate; a light-emitting device provided on the second region of the substrate; and a first insulating pattern covering a side surface of the HEMT device, wherein the first insulating pattern overlaps the separation layer in the second direction.
Public/Granted literature
- US20210091279A1 SEMICONDUCTOR DEVICE, METHOD OF FABRICATING THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME Public/Granted day:2021-03-25
Information query
IPC分类: