Invention Grant
- Patent Title: Mask
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Application No.: US16332472Application Date: 2017-10-13
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Publication No.: US11363844B2Publication Date: 2022-06-21
- Inventor: Tetsuya Sato , Tomokazu Nagao , Tsuruo Nakayama
- Applicant: NBC MESHTEC INC.
- Applicant Address: JP Tokyo
- Assignee: NBC MESHTEC INC.
- Current Assignee: NBC MESHTEC INC.
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2016-203340 20161017
- International Application: PCT/JP2017/037107 WO 20171013
- International Announcement: WO2018/074337 WO 20180426
- Main IPC: A41D13/11
- IPC: A41D13/11 ; A62B18/02 ; A62B23/02 ; A61K33/34 ; A61K33/38 ; A62B7/10

Abstract:
A mask having an inner surface facing a wearer and an outer surface located opposite to the inner surface has first to fourth filters. The first filter is disposed on the outer surface of the mask and has air permeability and a water absorption capacity of 100% or more and less than 1000%. The second filter is layered on the first filter on the side of the inner surface of the mask and has air permeability and a water absorption capacity of less than 30%. The third filter is layered on the second filter on the side of the inner surface of the mask and is formed of an electret filter having air permeability and a water absorption capacity of less than 50%. The fourth filter is disposed on the inner surface of the mask and has air permeability.
Public/Granted literature
- US20190231004A1 MASK Public/Granted day:2019-08-01
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