- 专利标题: Memory cells having resistors and formation of the same
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申请号: US16892459申请日: 2020-06-04
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公开(公告)号: US11374059B2公开(公告)日: 2022-06-28
- 发明人: Fabio Pellizzer , Andrea Redaelli , Agostino Pirovano , Innocenzo Tortorelli
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Brooks, Cameron & Huebsch, PLLC
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; H01L45/00 ; H01L49/02
摘要:
The present disclosure includes memory cells having resistors, and methods of forming the same. An example method includes forming a first conductive line, forming a second conductive line, and forming a memory element between the first conductive line and the second conductive line. Forming the memory element can include forming one or more memory materials, and forming a resistor in series with the one or more memory materials. The resistor can be configured to reduce a capacitive discharge through the memory element during a state transition of the memory element.
公开/授权文献
- US20200303462A1 MEMORY CELLS HAVING RESISTORS AND FORMATION OF THE SAME 公开/授权日:2020-09-24
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