Invention Grant
- Patent Title: Substrate holder and method of manufacturing a substrate holder
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Application No.: US17132084Application Date: 2020-12-23
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Publication No.: US11376663B2Publication Date: 2022-07-05
- Inventor: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: B22F7/06
- IPC: B22F7/06 ; B23K26/354 ; B23K26/342 ; G03F7/20 ; B22F10/20 ; B22F10/00 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B33Y10/00 ; B33Y80/00
Abstract:
An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
Public/Granted literature
- US20210107061A1 SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER Public/Granted day:2021-04-15
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