Invention Grant
- Patent Title: 8T dual port SRAM and a manufacturing method thereof
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Application No.: US17224386Application Date: 2021-04-07
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Publication No.: US11380389B2Publication Date: 2022-07-05
- Inventor: Pinhan Chen , Yulin Wang , Bangwei Shen
- Applicant: Shanghai Huali Integrated Circuit Corporation
- Applicant Address: CN Shanghai
- Assignee: Shanghai Huali Integrated Circuit Corporation
- Current Assignee: Shanghai Huali Integrated Circuit Corporation
- Current Assignee Address: CN Shanghai
- Agency: Banner & Witcoff, Ltd.
- Priority: CN202010450665.8 20200525
- Main IPC: G11C11/412
- IPC: G11C11/412 ; G11C11/419 ; H01L27/11

Abstract:
The memory comprises a first pass gate transistor, a second pass gate transistor, a third pass gate transistor, and a fourth pass gate transistor. On-resistance of the second pass gate transistor is smaller than that of the first pass gate transistor, so that first read current flowing from a first read/write port of a first group of read/write dual ports is equal to second read current flowing from a second read/write port of the first group of read/write dual port. On-resistance of the fourth pass gate transistor is smaller than that of the third pass gate transistor, so that third read current flowing from a first read/write port of a second group of read/write dual ports is equal to fourth read current flowing from a second read/write port of the second group of read/write dual port.
Public/Granted literature
- US20210366537A1 8T Dual Port SRAM and a Manufacturing Method Thereof Public/Granted day:2021-11-25
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