- 专利标题: Deposition mask, deposition mask apparatus, manufacturing method of deposition mask, and manufacturing method of deposition mask apparatus
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申请号: US16726431申请日: 2019-12-24
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公开(公告)号: US11380546B2公开(公告)日: 2022-07-05
- 发明人: Masato Ushikusa , Yusuke Nakamura , Hideyuki Okamoto , Yoshinori Murata
- 申请人: Dai Nippon Printing Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Burr & Brown, PLLC
- 优先权: JPJP2017-132162 20170705
- 主分类号: H01L21/033
- IPC分类号: H01L21/033 ; H01L51/50 ; H05B33/10 ; C23C14/04 ; C23C14/24 ; H01L51/00
摘要:
A deposition mask includes: a first mask having an opening formed therein; and a second mask superposed on the first mask and having a plurality of through-holes formed therein, the through-hole having a planar dimension smaller than a planar dimension of the opening; wherein: the deposition mask has a plurality of joints that join the second mask and the first mask to each other; the plurality of joints are arranged along an outer edge of the second mask; and a notch is formed at a position in the outer edge of the second mask, the position corresponding to a space between the adjacent two joints.
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