Invention Grant
- Patent Title: Cleaning method for photo masks and apparatus therefor
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Application No.: US17109878Application Date: 2020-12-02
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Publication No.: US11385538B2Publication Date: 2022-07-12
- Inventor: Hsin-Chang Lee , Pei-Cheng Hsu , Hao-Ping Cheng , Ta-Cheng Lien
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F1/64
Abstract:
In a method of cleaning a photo mask, the photo mask is placed on a support such that a patterned surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.
Public/Granted literature
- US20210373436A1 CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR Public/Granted day:2021-12-02
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