Invention Grant
- Patent Title: Multicathode deposition system
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Application No.: US16536641Application Date: 2019-08-09
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Publication No.: US11387085B2Publication Date: 2022-07-12
- Inventor: Sanjay Bhat , Vibhu Jindal , Kamatchigobinath Manoharan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34 ; C23C14/14
Abstract:
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.
Public/Granted literature
- US20200051797A1 Multicathode Deposition System Public/Granted day:2020-02-13
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