公开(公告)号：US11940724B2

公开(公告)日：2024-03-26

申请号：US17110514

申请日：2020-12-03

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal

IPC: G03F1/20 ,  G03F7/00 ,  G03F7/09 ,  G03F9/00

CPC classification number: G03F1/20 ,  G03F7/09 ,  G03F7/70283 ,  G03F7/70716 ,  G03F7/70741 ,  G03F9/7096

Abstract: Provided herein are apparatus, systems and methods for processing reticle blanks. A reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier base assembly supported on the support assembly. The carrier base assembly comprises a wall extending from a top surface of the carrier base and defining a containment region for a reticle.

公开(公告)号：US11515132B2

公开(公告)日：2022-11-29

申请号：US17316883

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal ,  Vishwas Kumar Pandey

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/35 ,  C22C9/04 ,  C22C9/06 ,  B23K15/00 ,  B23K1/20 ,  B23K1/00 ,  B23K1/19 ,  C23C14/54 ,  B23K103/12

Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.

公开(公告)号：US11387085B2

公开(公告)日：2022-07-12

申请号：US16536641

申请日：2019-08-09

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal ,  Kamatchigobinath Manoharan

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/14

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.

公开(公告)号：US20220106679A1

公开(公告)日：2022-04-07

申请号：US17552505

申请日：2021-12-16

Applicant: Applied Materials, Inc.

Inventor： Vibhu Jindal ,  Sanjay Bhat

IPC: C23C14/35 ,  C23C14/04 ,  C23C14/34 ,  C23C14/18 ,  H01J37/34

Abstract: A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.

公开(公告)号：US20210173295A1

公开(公告)日：2021-06-10

申请号：US17110514

申请日：2020-12-03

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal

IPC: G03F1/20 ,  G03F7/09 ,  G03F7/20

Abstract: Provided herein are apparatus, systems and methods for processing reticle blanks. A reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier base assembly supported on the support assembly. The carrier base assembly comprises a wall extending from a top surface of the carrier base and defining a containment region for a reticle.

公开(公告)号：US20200335331A1

公开(公告)日：2020-10-22

申请号：US16850670

申请日：2020-04-16

Applicant: Applied Materials, Inc.

Inventor： Wen Xiao ,  Vibhu Jindal ,  Sanjay Bhat

IPC: H01L21/02 ,  H01L21/687 ,  H01L21/68

Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.

公开(公告)号：US11480865B2

公开(公告)日：2022-10-25

申请号：US17120789

申请日：2020-12-14

Applicant: Applied Materials, Inc.

Inventor： Vibhu Jindal ,  Sanjay Bhat ,  Wen Xiao ,  Vinodh Ramachandran

IPC: G03F1/24 ,  G03F1/60

Abstract: Apparatus and methods for improving flatness of extreme ultraviolet (EUV) mask blanks are disclosed. The apparatus and methods may utilize one or more of heating the backside and/or the front side of the EUV mask blank and a cooling system. Interfacial layers of the EUV mask blank are selectively heated, resulting in improved flatness of the EUV mask blanks.

公开(公告)号：US11236415B2

公开(公告)日：2022-02-01

申请号：US16444570

申请日：2019-06-18

Applicant: Applied Materials, Inc.

Inventor： Vibhu Jindal ,  Sanjay Bhat

IPC: C23C14/04 ,  C23C14/34 ,  C23C14/14

Abstract: A deposition system and a method of operation thereof are disclosed. A PVD chamber is disclosed comprising a plurality of cathode assemblies, a rotating shield below the plurality of cathode assemblies to expose one of the plurality cathode assemblies through the shroud and through a shield hole of the shield, the shield comprising a top surface including a raised peripheral frame. A shield mount sized and shaped to engage with the raised peripheral frame to secure the shield mount to the shield.

公开(公告)号：US11230761B2

公开(公告)日：2022-01-25

申请号：US16444560

申请日：2019-06-18

Applicant: Applied Materials, Inc.

Inventor： Vibhu Jindal ,  Sanjay Bhat

IPC: C23C14/35 ,  C23C14/04 ,  C23C14/34 ,  C23C14/18 ,  H01J37/34

Abstract: A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.

公开(公告)号：US20210172054A1

公开(公告)日：2021-06-10

申请号：US17110518

申请日：2020-12-03

Applicant: Applied Materials, Inc.

Inventor： Sanjay Bhat ,  Vibhu Jindal

IPC: C23C14/34 ,  C23C14/50

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising a deposition ring assembly comprising an inner and outer deposition ring which reduces particle defects.